Barrington James seeks a highly skilled researcher to advance computational modelling in Barcelona at the intersection of lithography and resist physics. You will develop simulation tools for resist behavior and help optimize lithography performance.
Collaborating with multidisciplinary teams, you will validate models against experimental data and contribute to process improvements in semiconductor development.
📌 Senior Lithography Simulation & Photoresist Engineer (Barcelona)
🏢 Barrington James
📍 Barcelona
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