pBarrington James seeks a highly skilled researcher to advance computational modelling in Barcelona at the intersection of lithography and resist physics. You will develop simulation tools for resist behavior and help optimize lithography performance. /ppCollaborating with multidisciplinary teams, you will validate models against experimental data and contribute to process improvements in semiconductor development. /p #J-18808-Ljbffr
📌 Senior Lithography Simulation & Photoresist Engineer (Barcelona)
🏢 Barrington James
📍 Barcelona
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