Pics@Icfo Strategic Initiative: Postdoctoral Researcher In Tgv Metallization And Seed-Layer Processes (Barcelona)

Pics@Icfo Strategic Initiative: Postdoctoral Researcher In Tgv Metallization And Seed-Layer Processes (Barcelona)

19 oct
|
Institute Of Photonic Sciences
|
Barcelona

19 oct

Institute Of Photonic Sciences

Barcelona

PICs@ICFO Strategic Initiative: Postdoctoral Researcher in TGV Metallization and Seed-Layer Processes
As part of the
PICs@ICFO Strategic Initiative
, ICFO coordinates PIXEurope, a flagship
Pilot Line funded under the European Chips JU program
, focused on Advanced Photonic Integrated Circuits (PICs) through which ICFO is advancing frontier technologies, including optical interposers for Co-packaged optics for next-generation optoelectronic and photonic devices.
To strengthen this initiative, ICFO is seeking a highly motivated Engineer/Scientist with strong expertise in thin-film deposition and metallization of high-aspect-ratio Through-Glass Vias (TGVs).
Position Overview:
,
We offer a post-doctoral position to a scientist with hands-on experience in thin-film deposition, surface preparation, and metallization for semiconductor, MEMS, or advanced-packaging applications.
The successful candidate will develop, optimize, and scale reliable adhesion, barrier, and conductive seed layers inside high-aspect-ratio glass vias,



ensuring continuity and compatibility with subsequent copper plating and interconnection processes.
Key Responsibilities:
,
The selected candidate will be expected to:
Develop and optimize seed-layer deposition processes for high-aspect-ratio Through-Glass Vias
Develop substrate cleaning, glass-surface activation, and adhesion-promotion processes
Develop adhesion, barrier, and conductive seed stacks such as Ti/Cu, Cr/Cu, TiW/Cu, and related systems
Optimize sputtering, evaporation, electroless, ALD or CVD-assisted, and hybrid deposition approaches
Achieve continuous and conformal seed coverage along via entrances, sidewalls, and exits
Characterize thickness, morphology, resistivity, adhesion, continuity, and wafer-level uniformity
Identify and mitigate shadowing, seed discontinuity, oxidation, delamination, and cracking
Coordinate with the laser and glass team to align via geometry and surface condition with seeding, plating, and interconnection requir

📌 Pics@Icfo Strategic Initiative: Postdoctoral Researcher In Tgv Metallization And Seed-Layer Processes (Barcelona)
🏢 Institute Of Photonic Sciences
📍 Barcelona

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