Lace Lithography is building a revolutionary chip lithography technology and is seeking a candidate to bridge Resist Chemistry and Mask Optimization through computational modeling. You will work on simulations predicting LER/LWR and guide process window optimization, while collaborating with teams in Barcelona and Bergen. The role requires a PhD or equivalent in a related field with strong computational focus, and experience in photolithography and semiconductor processing.
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📌 Senior Resist Modeling Engineer (Lithography & Monte Carlo) (Madrid)
🏢 Lace Lithography
📍 Madrid
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