Lace Lithography is building a revolutionary chip lithography technology and is seeking a candidate to bridge Resist Chemistry and Mask Optimization through computational modeling. You will work on simulations predicting LER/LWR and guide process window optimization, while collaborating with teams in Barcelona and Bergen. The role requires a Ph D or equivalent in a related field with strong computational focus, and experience in photolithography and semiconductor processing. #J-18808-Ljbffr
📌 Senior Resist Modeling Engineer (Lithography & Monte Carlo) (Barcelona)
🏢 Talent
📍 Barcelona
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