12 ago
|
Lace Lithography
|
Barcelona
12 ago
Lace Lithography
Barcelona
Lace Lithography is building a revolutionary chip lithography technology and is seeking a candidate to bridge Resist Chemistry and Mask Optimization through computational modeling. You will work on simulations predicting LER/LWR and guide process window optimization, while collaborating with teams in Barcelona and Bergen.
The role requires a PhD or equivalent in a related field with strong computational focus, and experience in photolithography and semiconductor processing.
📌 Senior Resist Modeling Engineer (Barcelona)
🏢 Lace Lithography
📍 Barcelona