We’re on a mission to do something really, really small. You’ll simulate the chemistry that brings our patterns to life.
At Lace Lithography, we’re building a revolutionary chip lithography technology that will dramatically improve chip performance for decades to come. Founded in 2023, we’re based in Bergen (Norway) and Barcelona (Spain), and backed by some of the world’s most ambitious investors.
Who Are We Looking For
You will act as the vital bridge between our Resist Chemistry and Mask Optimization teams, ensuring our computational models match real-world process constraints. You thrive in a collaborative fast paced environment working on complex, interconnected, and evolving problems with a strong drive to learn new concepts.
What you’ll do
Model the aerial image-to-pattern transfer through the resist, accounting for stochastic effects predicting critical parameters like LER and LWR).
Build a full resist simulation framework for a variety of resist materials, integrating resist activation physics into our resist-mask optimization framework.
Develop and apply process-level or Monte Carlo simulation methods to predict resist performance and guide process window optimization.
Work with our Bergen team and external collaborators to optimize resist behaviour and performance.
Who you are
Minimum Qualifications
PhD or equivalent professional experience in Applied Physics, Chemical Engineering, Materials Science, or a related field with a strong focus on computational simulations.
Strong knowledge in the fundamentals of photolithography, resist chemistry, and semiconductor processing.
Proven expertise in process-level or Monte Carlo simulations.
2+ years of industry or applied research experience in lithography or semiconductor process R&D.;
Desired qualifications
Prior experience in computational modeling of photoresist materials.
Strong coding skills in Python/Julia frameworks.
Experience collaborating closely with experimental/lab teams to derive semi-emperical