This role sits at the intersection of computational modelling, photoresist physics, and semiconductor process development. You'll work closely with multidisciplinary teams to develop advanced simulation tools that accurately predict resist behaviour and help optimize lithography performance. Responsibilities Develop computational models that simulate the transfer of aerial images into resist patterns, including stochastic effects such as line edge roughness (LER) and line width roughness (LWR). Design and enhance simulation frameworks for a range of photoresist materials, incorporating the underlying physics and chemistry of resist activation. Apply process-level and Monte Carlo simulation techniques to evaluate resist performance and improve process windows.



Collaborate with cross-functional engineering and research teams to validate models against experimental data and drive continuous improvements. Requirements Ph D (or equivalent industry experience) in Applied Physics, Materials Science, Chemical Engineering, Computational Physics, or a related discipline. Strong understanding of photolithography, photoresist chemistry, and semiconductor fabrication processes. At least 2 years of industrial or applied research experience within semiconductor process development or lithography. #J-18808-Ljbffr

📌 Senior Resist Modelling Engineer (Barcelona)
🏢 Barrington James
📍 Barcelona