This role sits at the intersection of computational modelling, photoresist physics, and semiconductor process development. You'll work closely with multidisciplinary teams to develop advanced simulation tools that accurately predict resist behaviour and help optimize lithography performance.
Responsibilities
- Develop computational models that simulate the transfer of aerial images into resist patterns, including stochastic effects such as line edge roughness (LER) and line width roughness (LWR).
- Design and enhance simulation frameworks for a range of photoresist materials, incorporating the underlying physics and chemistry of resist activation.
- Apply process-level and Monte Carlo simulation techniques to evaluate resist performance and improve process windows.
- Collaborate with cross-functional engineering and research teams to validate models against experimental data and drive continuous improvements.
Requirements
- PhD (or equivalent industry experience) in Applied Physics, Materials Science, Chemical Engineering, Computational Physics, or a related discipline.
- Strong understanding of photolithography, photoresist chemistry, and semiconductor fabrication processes.
- Hands-on experience developing process-level and/or Monte Carlo simulation models.
- At least 2 years of industrial or applied research experience within semiconductor process development or lithography.
Following your application Jake Phillips, a specialist recruiter will discuss the opportunity with you in detail. Jake will be more than happy to answer any questions relating to the industry and the potential for your career growth. The conversation can also progress further to discussing other opportunities, which are also available right now or will be imminently becoming available. This position has been highly popular, and it is likely that it will close shortly. We recommend applying as soon as possible to avoid disappointment.
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📌 Senior Resist Modelling Engineer (Barcelona)
🏢 Barrington James
📍 Barcelona